GORGEOUS CERAMICS (GGS) silicon carbide vacuum chucks are manufactured using an isostatic pressing process and high-temperature sintering.
We can design the shape, dimensions, thickness, and form according to your provided drawings to meet your specific application requirements.
Applications of Silicon Carbide Vacuum Chucks
In semiconductor manufacturing, ultrathin wafers can be fixed to the surface of a silicon carbide vacuum chuck by connecting a vacuum generator, utilizing the suction force of the vacuum to achieve contamination-free clamping.
Ceramic vacuum chucks are widely used in applications such as photolithography, etching, laser processing, and wafer inspection.
Features and Advantages of Silicon Carbide Vacuum Chucks
Thermal Stability: Using high-purity silicon carbide as the raw material, it exhibits dimensional stability, maintaining micron-level deformation control even at high temperatures.
High Thermal Conductivity/Low Thermal Expansion: It possesses high thermal conductivity and a low coefficient of thermal expansion, resulting in excellent temperature uniformity and reducing wafer thermal stress and warpage risk.
High Wear Resistance and Surface Precision: Silicon carbide has a hardness approaching that of diamond, allowing for sub-micron-level surface smoothness.
Corrosion Resistance: It exhibits extremely high resistance to strong acids, strong alkalis, and various corrosive chemical media.
Plasma Shock Resistance: It demonstrates extremely strong resistance to plasma etching and cleaning environments.
