Aluminum nitride ceramic robotic arms, also known as aluminum nitride ceramic robotic fingers, wafer trays, or round wafer robotic arms, are mainly used for the transportation and handling of semiconductor equipment, responsible for delivering silicon wafers to designated locations.
Aluminum nitride robotic arms combine high thermal conductivity, excellent electrical insulation, a low coefficient of thermal expansion, and superior dimensional stability, greatly contributing to ensuring precise wafer transport and minimizing particle generation and thermal deformation.
GORGEOUS CERAMICS (GGS) can custom-produce aluminum nitride ceramic robotic arms based on customer-provided drawings and supports semiconductor equipment manufacturers (OEMs), automation integrators, and advanced equipment manufacturers worldwide.
Key Properties of Aluminum Nitride Ceramics
熱伝導率
Aluminum nitride ceramics boast a high thermal conductivity of 170–200 W/m·K, enabling rapid heat dissipation and minimizing temperature gradients during wafer processing.
電気絶縁
The electrical insulation properties of aluminum nitride ceramics provide reliable electrical isolation for semiconductor devices operating under high voltage or sensitive process conditions.
Vacuum Compatibility
Aluminum nitride ceramics are ideally suited for vacuum chambers and cleanroom environments due to their low gas release characteristics.
Lightweight and Highly Rigid
Compared to metal robotic arms, aluminum nitride ceramic arms maintain structural integrity while minimizing deformation.
セラミックアーム/エンドエフェクタ標準サイズリファレンス
ウェーハに応じてセラミックアームの長さを選択します。
6-inch wafer (150mm): Arm length: about 200-250mm
8-inch wafer (200mm): Arm length: about 250-300mm
12-inch wafer (300mm): Arm length: about 350-400mm
18-inch wafer (450mm): Arm length: about 500-550mm
セラミックアームの幅と厚さ
Width: Typically 20-50mm, depending on your wafer size and required arm load capacity.
Thickness: Typically 5-15mm, to ensure adequate strength and rigidity and reduce weight.
アームエンドデザイン
Fork design: commonly used for handling wafers, the width and spacing of the forks match the slots of the wafer box
Vacuum suction cup design: can directly absorb the wafer, the common suction cup size is 10-20mm
Edge clamping design: used for special processes, the clamping area width is 5-10mm
Applications of ceramic arms
チップ製造プロセスでは、シリコン ウェハをさまざまなプロセス ステップ (リソグラフィー、エッチング、堆積など) 間で転送する必要があり、セラミック アームは、ほこりのない環境でのハンドリング マニピュレーターとして機能します。
電子機器製造用セラミックアームは、真空コーティング、チップ製造、OLEDディスプレイ製造など、高い清浄度が求められるプロセスに適しています。金属材料の熱膨張の影響を回避し、安定性を向上させます。
耐腐食性や高温環境への耐性が求められる実験装置では、化学合成、プラズマ実験、超伝導研究などの分野でセラミックアームが活用されています。
セラミック材料には金属イオンの沈殿が含まれず、非常に高い材料清浄度が要求される食品加工や医薬品包装などの分野に適しています。
よくある質問
What is an aluminum nitride ceramic robotic arm?
An aluminum nitride ceramic robotic arm is a type of precision ceramic component widely used in semiconductor and automation equipment for wafer handling and material transfer.
Why choose aluminum nitride over metal robotic arms?
Because aluminum nitride ceramics have high thermal conductivity, excellent electrical insulation, and dimensional stability.
Can GORGEOUS CERAMICS (GGS) manufacture robotic arms according to customer drawings?
Yes, we can provide customized services based on customer specifications and CAD drawings.
