ALN-verwarmer

ALN-verwarmer is een van onze aanbevolen producten, het beste van twee werelden combineren: keramiek en metaal. Dit innovatieve ontwerp, bereikt door metallisatie, maakt het de perfecte oplossing voor uw verschillende halfgeleider- en elektronische apparatuurproductie behoeften.

ALN-verwarmer

Wij maken gebruik van hoogwaardig aluminium nitride materiaal om de ALN Heater te voorzien van een uitzonderlijke thermische uniformiteit en corrosiebestendigheid, waardoor het ideaal geschikt is voor waferverwerking. Aanvullend, wij bieden op maat gemaakte diensten om tegemoet te komen aan uw uiteenlopende behoeften, jou helpen de productie- en verwerkingsefficiëntie verbeteren terwijl u de kwaliteit van uw producten verbetert.

 


Aluminum Nitride Heater Applications

Used in Semiconductor Manufacturing Equipment

Aluminum nitride heaters possess high thermal conductivity, excellent insulation properties, resistance to plasma corrosion, and uniform heating capabilities, making them suitable for use in wafer manufacturing equipment such as wafer chuck heaters, electrostatic chuck heaters (ESC heaters), and chemical vapor deposition (CVD) equipment.

GORGEOUS CERAMICS (GGS) has partnered with numerous semiconductor equipment manufacturers and wafer foundries, custom-shipping multiple batches of aluminum nitride ceramic heating elements, which have received widespread acclaim.

Used in vacuum equipment

Aluminum nitride heaters can operate stably for extended periods in high vacuum environments without releasing contaminants, making them an ideal choice for vacuum systems.

Common applications include vacuum chamber heating, vacuum stage heating, sample heating platforms, vacuum transfer modules, and analytical instruments.


Characteristics of ALN heaters

ALN-verwarmer

Temperature Uniformity:

GORGEOUS CERAMICS (GGS) aluminum nitride heaters are made from highly thermally conductive aluminum nitride, ensuring excellent temperature uniformity over a wide temperature range (up to 790 degrees Celsius). This translates to temperature stability during wafer fabrication, ultimately improving product yield and production speed.

Ruimtebesparend ontwerp:

By co-sintering the resistance heating element and bulk RF electrode within the aluminum nitride ceramic, we have achieved a compact and efficient design for the aluminum nitride heater. This not only reduces the overall size of the equipment but also improves heating efficiency and heat transfer rate, thus saving valuable production space.

Corrosion Resistance:

Aluminum nitride ceramic heaters exhibit excellent resistance to corrosion from halogen gases and oxidizing environments. This allows them to maintain long-term stability under high-temperature and continuous operation conditions, extending equipment life and reducing daily operating and maintenance costs.

Wafer Clamping Function Design Pending:

By sintering the RF electrode together with the ceramic plate, the aluminum nitride heater integrates the function of an electrostatic chuck electrode for wafer clamping. This feature simplifies your production process, thereby increasing production speed and efficiency—a highly valuable advantage in wafer fabrication.

Oplossingen op maat:

We understand that every manufacturing process has unique requirements. Therefore, we offer customized aluminum nitride heater solutions to meet your diverse needs. Whether it’s size, power requirements, or electrode configuration, we can tailor products to your specific manufacturing process for a perfect fit.

 


ALN Material Properties Data

De volgende tabel vat de belangrijkste eigenschappen van AlN-materiaal samen:

Naam Zuiverheid [%] Dichtheid [g/cm³] Volumeweerstand [Ωcm] (kamertemperatuur) Thermische geleidbaarheid [W/m·K] (kamertemperatuur) Thermische uitzettingscoëfficiënt (1000℃) Sterkte [MPa] (kamertemperatuur) Young's modulus [GPa] (kamertemperatuur) Diëlektrische constante (13,56 MHz, relais)
AlN/Aluminium Nitride 95 3.3 >1E+15 170 5.7 >300 300 8.6
AlN/Aluminium Nitride 97 3.31 >1E+8 ~ +13 100 5.6 >300 300 8.8
AlN/Aluminium Nitride 99 3.32 >1E+15 80 5.6 >250 300 8.6

 


Veelgestelde vragen

What are the applications of aluminum nitride heaters?

Aluminum nitride heaters are primarily used in semiconductor equipment, vacuum systems, OLED manufacturing, laboratory instruments, medical devices, and laser equipment.

Why choose aluminum nitride heaters instead of alumina heaters?

Aluminum nitride heaters have a much higher thermal conductivity (several times that of alumina ceramics), enabling faster heat transfer, better temperature uniformity, and superior thermal management.

Can GORGEOUS CERAMICS (GGS) aluminum nitride heaters be customized?

Yes. Customization is available for dimensions, thickness, heating circuit, operating voltage, power density, temperature sensors (e.g., thermocouples or RTDs), mounting holes, metallization, and surface treatments.

What is the maximum operating temperature of aluminum nitride heaters?

Aluminum nitride heaters typically operate continuously within a temperature range of 400°C to 800°C.